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ASML’s plans to expand EUV production depend partly on Zeiss’s ability to increase qualified precision-optics output. The post ASML’s EUV Expansion Runs Through Zeiss appeared first on EE Times.
New neon gas recycling systems promise to reduce the demand for the noble gas at major chip manufacturers using DUV lithography. But as that technology is supplanted, this much-needed fix may only be needed temporarily.
Centre for Technology & Statecraft (CTS) calls for banning exports of all immersion DUV tools to China, echoes the MATCH Act by U.S. legislators.
ZNTC completes development of Russia's first 130nm-capable lithography stepper, which could be used to produce chips sometimes late this decade, or rather early next.
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